Attendees
500
SPIE Photomask Technology 2017 is organized between 11 Sep and 14 Sep 2017.
The Symposium sites will be Monterey Conference Center and Monterey Marriott in Monterey, California USA.
With a broad program covering a expansive array of subjects such as Optics, Lithography, Photonics, Photomask Technology, Patterning and Mask Technologies, SPIE Photomask Technology 2017 will be totally a must-attend event.
37th SPIE Photomask Technology + Extreme Ultraviolet Lithography Symposium is organized annually.
The annual meeting continues to grow! It is going to be likely to reach 500 participants this year.
The association of the SPIE Photomask Technology 2017 is The International Society for Optics and Photonics.
Conference:
11-14 September 2017
Exhibition:
12-13 September 2017
Exhibition Dates and Hours:
Tuesday 12 September 10:00 am to 4:00 pm
Wednesday 13 September 10:00 am to 4:00 pm
Important Dates:
Abstract Due Date: 24 April 2017
Author Notification: 19 June 2017
Manuscripts Due: 14 August 2017
Visitor Profile
- Engineers and designers
- Corporate managers
- Application and product developers
- Mask and chip designers
- Resist chemists
- Experts in mask infrastructure and mask integration
- Standards developers
Exhibitor Profile
- Mask Technologies: Inspection/repair, Metrology, Cleaning
- Mask business
- EUV
- Nanoimprint
- Direct write
- Patterning
- Wafers
- Tools
- Simulation
- Resists and substrates
- Materials and etching
Events in Number
Frequency
Annually
Venue
Monterey Conference Center
Address : 298 Portola Plaza, Monterey, CA 93940, USA
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Event Type
Association
The International Society for Optics and Photonics
Official Site
Weather of Monterey
20 °C
Clear clear sky
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